UPDATED. 2021-09-23 17:16 (목)
APTC to focus on newer etching equipment
APTC to focus on newer etching equipment
  • Jang Keyoung Yoon
  • 승인 2021.08.31 08:19
  • 댓글 0
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Firm reduces product lineup from 6 to 3
Image: APTC
Image: APTC

Fab equipment maker APTC has reduced its product lineup from six last year to three this year.

The company is removing older equipment and kits that have low demand.

APTC will no longer sell some of its plasma etching equipment and doping kits.

The firm focuses on 300mm wafer plasma etching equipment. Etchers are used in wafer fabrication to remove the parts of wafers that are no longer needed after the circuits are drawn.

APTC's main polysilicon etching equipment brand is called LEO NK __ there is LEO NK I, LEO NK I-C and LEO NK II.

It also sells metal etchers and plasma doping equipment.

The most popular of these kits is LEO NK I-C, launched in 2016. The company beat larger rivals such as Lam Research, Applied Materials and others to supply the kits to SK Hynix for the latter's factory at Wuxi.

The successor to that model, LEO WH, and the plasma doping equipment are being used in NAND flash and DRAM production by SK Hynix.


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