UPDATED. 2024-07-19 07:49 (금)
SK Hynix to adopt Inpria MOR in 1c DRAM
SK Hynix to adopt Inpria MOR in 1c DRAM
  • Noh Tae Min 기자
  • 승인 2024.05.30 07:33
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Image: Inpria
Image: Inpria

SK Hynix is planning to use Inpria’s metal oxide resist (MOR) in the production of 10-nanometer (nm) Gen 6 (1c) DRAM, TheElec has learned.

The resist is expected to be used by the chipmaker to draw the finest lines on the 1c DRAM. Sources said SK Hynix’s 1c DRAM has five extreme ultraviolet (EUV) layers and one of them will be drawn using MOR.

Meanwhile, Samsung is also considering using Inpria’s MOR in its own 1c DRAM, as reported earlier by TheElec.

Inpria is the subsidiary of Japanese chemical firm JSR and a leader in inorganic photoresist.

The firm has been collaborating with SK Hynix since 2022 in MOR research. SK Hynix has previously said the use of tin oxide resist will contribute to increased performance and cost reduction in future DRAMs.

Photoresists are used during the lithography process in chip production. Photoresist reacts chemically to light and this property is used to draw the circuit patterns on the wafer. 

MOR is considered the next generation of the chemically amplified resist (CAR) currently used in the lithography of advanced chips. 

CAR is facing limitations in PR resolution, etching resistance, and line edge roughness.

This is why companies such as Inpria and Lam Research are aiming to develop inorganic PR such as MOR to overcome the current limitations.


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