Auros Technology said on Monday that it has started the development of a new overlay measurement equipment aimed at use in the extreme ultraviolet (EUV) process.
Overlay measurement equipment is used to check the alignment of circuit patterns between the top surface and the bottom surface of wafers.
There are image-based overlay and diffraction-based overlay equipment.
Image-based kits have less precision out of the two but are faster and are used more by chipmakers.
Auros Technology already supplies image-based overlay measurement equipment for argon fluoride (ArF) and EUV fabs.
The South Korean equipment is planning to swap the lens and optical modules on this piece of equipment to make it more specific for EUV fabs.
EUV wavelengths are one-fourteenth of those of ArF which requires finer lenses in the equipment.
